Title:
QUANTUM DOT PATTERNING METHOD, METHOD FOR MANUFACTURING OPTICAL ELEMENT, METHOD FOR MANUFACTURING BACKLIGHT UNIT, AND METHOD FOR MANUFACTURING IMAGE DISPLAY DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/090065
Kind Code:
A1
Abstract:
The present invention relates to a quantum dot patterning method characterized by comprising: a step for applying a mixture containing quantum dots and a curable resin onto a substrate to obtain a resin layer; a step for discharging a curing agent in a pattern form on the resin layer by an inkjet method; a curing step for curing a part of the resin layer on which the curing agent has been discharged; and a step for removing the uncured part of the resin layer by means of a solvent. Thus, a quantum dot patterning method can be provided with which it is possible to stably form quantum dots in a desired pattern without being restricted due to the inkjet method and to suppress the deterioration of the quantum dots.
Inventors:
NOJIMA YOSHIHIRO (JP)
TOBISHIMA KAZUYA (JP)
AOKI SHINJI (JP)
TOBISHIMA KAZUYA (JP)
AOKI SHINJI (JP)
Application Number:
PCT/JP2022/039576
Publication Date:
May 25, 2023
Filing Date:
October 24, 2022
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
G02B5/20; H01L33/00; H01L33/50
Foreign References:
| JP2016157114A | 2016-09-01 | |||
| JP2005260135A | 2005-09-22 |
Attorney, Agent or Firm:
YOSHIMIYA Mikio et al. (JP)
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