Title:
RADIATION-SENSITIVE COMPOSITION AND NOVEL COMPOUND
Document Type and Number:
WIPO Patent Application WO/2011/030737
Kind Code:
A1
Abstract:
Disclosed is a radiation-sensitive composition capable of forming a chemically amplified positive resist film, which is effectively sensitive to (extreme) far ultraviolet rays such as KrF excimer lasers, ArF excimer lasers, and EUV, X-rays such as synchrotron radiation, and electron beams, and has excellent nano edge roughness, high sensitivity, and high resolution, and on which a fine pattern can be stably formed with high precision. The radiation-sensitive composition contains a radiation-sensitive acid generator represented by formula (0). In formula (0), R represents an optionally substituted organic group which contains a carbon atom, a hydrogen atom, and an oxygen atom, and has at least one ester bond, and M+ represents a monovalent onium cation.
Inventors:
MARUYAMA KEN (JP)
Application Number:
PCT/JP2010/065260
Publication Date:
March 17, 2011
Filing Date:
September 06, 2010
Export Citation:
Assignee:
JSR CORP (JP)
MARUYAMA KEN (JP)
MARUYAMA KEN (JP)
International Classes:
C07C309/17; C07C381/12; C08F12/02; C08F20/10; C08F20/28; C08F20/54; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| WO2009019793A1 | 2009-02-12 |
Foreign References:
| JP2010155824A | 2010-07-15 | |||
| JP2002131897A | 2002-05-09 | |||
| JP2002214774A | 2002-07-31 | |||
| JP2006525265A | 2006-11-09 | |||
| JP2004018394A | 2004-01-22 | |||
| JP2008133262A | 2008-06-12 | |||
| JP2008069146A | 2008-03-27 |
Other References:
ERA, MASANAO ET AL.: "Preparation of highly oriented poly(p-phenylenevinylene) thin film by using Langmuir-Blodgett technique", CHEMISTRY LETTERS, 1988, pages 1097 - 1100
Attorney, Agent or Firm:
KOJIMA SEIJI (JP)
Seiji Kojima (JP)
Seiji Kojima (JP)
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