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Title:
RADIATION SENSITIVE COMPOSITION, ORIGINAL PLATE FOR LITHOGRAPHIC PRINTING PLATE, AND METHOD OF MANUFACTURING LITHOGRAPHIC PRINTING PLATE
Document Type and Number:
WIPO Patent Application WO/2018/092661
Kind Code:
A1
Abstract:
The present invention provides a radiation sensitive composition which includes a radical initiator, a polymerizable radical component, and a radiation absorbent compound, and which has at least two peaks of radical generation amount in a radical generation amount versus time curve after exposure to image forming radiation. The present invention also provides: an original plate for a lithographic printing plate, the original plate having a support and an image recording layer, wherein the image recording layer includes a radical initiator, a polymerizable radical component, and a radiation absorbent compound, and has at least two peaks of radical generation amount in a radical generation amount versus time curve after exposure to image forming radiation; and a method of manufacturing a lithographic printing plate using said original plate for a lithographic printing plate.

Inventors:
SHIBAMOTO TADAO (JP)
MURAKAMI TAIRA (JP)
TSUMURA KYOSUKE (JP)
KUDO KOTARO (JP)
Application Number:
PCT/JP2017/040319
Publication Date:
May 24, 2018
Filing Date:
November 08, 2017
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/029; B41N1/14; C08F2/48; C08F220/28; G03F7/00; G03F7/004
Domestic Patent References:
WO2014050435A12014-04-03
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See also references of EP 3543790A4
Attorney, Agent or Firm:
TAIYO, NAKAJIMA & KATO (JP)
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