Title:
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTODEGRADABLE BASE
Document Type and Number:
WIPO Patent Application WO/2023/189502
Kind Code:
A1
Abstract:
This radiation-sensitive composition contains a polymer having an acid-dissociable group and a compound represented by formula (1). In formula (1), A1 represents a (m+n+2)-valent aromatic ring group. In formula (1), "-OH" and "-COO-" are bound to the same benzene ring in A1. An atom to which "-OH" is bound is located adjacent to an atom to which "-COO-" is bound. R1 represents a monovalent group having a cyclic(thio)acetal structure. M+ represents a monovalent organic cation.
Inventors:
NEMOTO RYUICHI (JP)
MIYAKE MASAYUKI (JP)
MITA MICHIHIRO (JP)
ABE YUDAI (JP)
KIRIYAMA KAZUYA (JP)
MIYAKE MASAYUKI (JP)
MITA MICHIHIRO (JP)
ABE YUDAI (JP)
KIRIYAMA KAZUYA (JP)
Application Number:
PCT/JP2023/009712
Publication Date:
October 05, 2023
Filing Date:
March 13, 2023
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Foreign References:
| JP2020203984A | 2020-12-24 |
Attorney, Agent or Firm:
YAMADA, Tsuyoshi (JP)
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