Title:
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2019/111727
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a radiation-sensitive composition having excellent sensitivity and nano edge roughness; and a resist pattern formation method. The present invention is a radiation-sensitive composition containing a metal-atom-containing compound and an electron acceptor, wherein the content of the metal-atom-containing compound is 50% by mass or more relative to a total solid content. It is preferred that a metal atom contained in the metal-atom-containing compound belongs to Periods 4 to 7 in Groups 4 to 16 on the periodic table. It is preferred that the metal atom contained in the metal-atom-containing compound is hafnium, tantalum, zinc, germanium or tin. It is preferred that the electron acceptor is a compound having a sulfonyl group, a compound having an aromatic hydroxy group, a tetracyanoquinodimethane compound or a combination thereof.
Inventors:
NAGAI TOMOKI (JP)
NAKAGAWA HISASHI (JP)
NAKAGAWA HISASHI (JP)
Application Number:
PCT/JP2018/043197
Publication Date:
June 13, 2019
Filing Date:
November 22, 2018
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; G03F7/20
Domestic Patent References:
| WO2016111300A1 | 2016-07-14 | |||
| WO2017204090A1 | 2017-11-30 | |||
| WO2017164018A1 | 2017-09-28 |
Attorney, Agent or Firm:
AMANO Kazunori (JP)
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