Title:
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2022/130869
Kind Code:
A1
Abstract:
A radiation-sensitive composition comprising (A) a polymer containing a structural unit having a hydroxyl group bound to an aromatic ring and an acid-generating compound having a radiation-sensitive onium cation and an organic anion (provided that the polymer (A) is excluded), in which, with respect to at least one compound selected from the group consisting of the polymer (A) and the acid-generating compound, a radiation-sensitive onium cation structure [X] having two or more of at least one substituent β selected from the group consisting of a fluoroalkyl group and a fluoro group (provided that a fluoro group contained in a fluoroalkyl group is excluded) and an organic anion structure [Y] having an iodine group are contained in each of these compounds or are contained respectively in these compounds.
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Inventors:
MARUYAMA KEN (JP)
Application Number:
PCT/JP2021/041883
Publication Date:
June 23, 2022
Filing Date:
November 15, 2021
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
C09K3/00; G03F7/004; G03F7/039; G03F7/20
Foreign References:
| JP2020183375A | 2020-11-12 | |||
| JP2020187349A | 2020-11-19 | |||
| JP2018197853A | 2018-12-13 | |||
| JP2018159744A | 2018-10-11 | |||
| JP2020181064A | 2020-11-05 |
Attorney, Agent or Firm:
YAMADA, Tsuyoshi (JP)
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