Title:
RADIATION-SENSITIVE COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2016/158170
Kind Code:
A1
Abstract:
The present invention is a radiation-sensitive composition containing a resist base material (A), a diazonaphthoquinone optically active compound (B), and a solvent (C). The composition has a solid component content of 1%-80% by mass and a solvent content of 20%-99% by mass. The resist base material (A) is indicated by a prescribed formula.
More Like This:
Inventors:
ECHIGO MASATOSHI (JP)
TOIDA TAKUMI (JP)
SATO TAKASHI (JP)
TOIDA TAKUMI (JP)
SATO TAKASHI (JP)
Application Number:
PCT/JP2016/056337
Publication Date:
October 06, 2016
Filing Date:
March 02, 2016
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO (JP)
International Classes:
G03F7/022; C08G8/04
Domestic Patent References:
WO2005101127A1 | 2005-10-27 | |||
WO2015008560A1 | 2015-01-22 | |||
WO2013024778A1 | 2013-02-21 |
Foreign References:
JPH04296754A | 1992-10-21 | |||
JP2014199312A | 2014-10-23 | |||
JP2007206562A | 2007-08-16 | |||
JP2006098869A | 2006-04-13 | |||
JPH1097066A | 1998-04-14 |
Attorney, Agent or Firm:
INABA, Yoshiyuki et al. (JP)
Yoshiyuki Inaba (JP)
Yoshiyuki Inaba (JP)
Download PDF:
Previous Patent: RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN
Next Patent: CATHETER ASSEMBLY
Next Patent: CATHETER ASSEMBLY