Title:
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2022/064863
Kind Code:
A1
Abstract:
Provided are a radiation-sensitive resin composition and a pattern formation method, which enable exertion of sufficient levels of sensitivity and CDU performance when next generation technology is applied. This radiation-sensitive resin composition contains: at least one onium salt including an anion part of an organic acid and a cation part of an onium; a compound having a structure in which an alkoxycarbonyl group is bound to a nitrogen atom; and a solvent. At least a portion of the anion part of the organic acid in the onium salt includes an iodine-substituted aromatic ring structure. At least a portion of the cation part of the onium includes a fluorine-substituted aromatic ring structure.
Inventors:
MARUYAMA KEN (JP)
Application Number:
PCT/JP2021/028755
Publication Date:
March 31, 2022
Filing Date:
August 03, 2021
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
C08F20/18; G03F7/004; G03F7/039; G03F7/20
Foreign References:
| JP2020098330A | 2020-06-25 | |||
| JP2019074592A | 2019-05-16 | |||
| JP2017058447A | 2017-03-23 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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