Title:
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2023/095563
Kind Code:
A1
Abstract:
Provided are: a radiation-sensitive resin composition, from which a resist film capable of exhibiting satisfactory levels of sensitivity, CDU performance, pattern circularity, LWR performance and pattern rectangularity can be formed in the formation of a resist pattern having a high aspect ratio; and a pattern formation method. The radiation-sensitive resin composition comprises: an onium salt compound represented by formula (1); a resin containing a first structural unit having an acid-dissociating group and a second structural unit having a polycyclic lactone structure, a polycyclic sultone structure or a polycyclic carbonate structure; and a solvent. (In formula (1), R1 represents a monovalent linear organic group having 1 to 40 carbon atoms; R2 and R3 independently represent a hydrogen atom, a fluorine atom, a monovalent hydrocarbon group, or a monovalent fluorinated hydrocarbon group; Rf11 and Rf12 independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group; m1 and m2 independently represent an integer of 1 to 4; R4, R5, R6, R7 and R8 independently represent a hydrogen atom, a hydroxy group, a halogen atom, or a monovalent organic group having 1 to 20 carbon atoms; when there are a plurality of R8's, two of the plurality of R8's are bonded to each other to form a 5- to 20-membered cyclic structure in conjunction with two carbon atoms in a benzene ring in formula (1) to which these residues are respectively bonded; n1 and n2 independently represent an integer of 1 to 4; and n3 represents an integer of 1 to 5.)
Inventors:
MIYAKE MASAYUKI (JP)
NEMOTO RYUICHI (JP)
KITANO NATSUMI (JP)
HIKAMI YUICHI (JP)
NEMOTO RYUICHI (JP)
KITANO NATSUMI (JP)
HIKAMI YUICHI (JP)
Application Number:
PCT/JP2022/040650
Publication Date:
June 01, 2023
Filing Date:
October 31, 2022
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| WO2019054311A1 | 2019-03-21 | |||
| WO2020049859A1 | 2020-03-12 | |||
| WO2015159830A1 | 2015-10-22 |
Foreign References:
| JP2020187352A | 2020-11-19 | |||
| US20200209743A1 | 2020-07-02 | |||
| JP2014178645A | 2014-09-25 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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