Title:
RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2023/153294
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide: a radiation-sensitive resin composition which enables the formation of a resist film having excellent sensitivity, LWR performance, water repellency and development defect reducing properties and has satisfactory storage stability; and a pattern formation method. Provided is a radiation-sensitive resin composition comprising: a polymer containing a structural unit (I) represented by formula (1) and a structural unit different from the structural unit (I); a radiation-sensitive acid generator represented by formula (α); and a solvent. (In formula (1), RK1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; L1 represents an alkanediyl group having 1 to 5 carbon atoms; and Rf1 represents a fluorinated hydrocarbon group having 5 to 7 fluorine atoms and also having 2 to 10 carbon atoms.) (In formula (α), RW represents a monovalent organic group containing a cyclic structure and having 3 to 40 carbon atoms; Rfa and Rfb each independently represent a fluorine atom or a fluorinated hydrocarbon group having 1 to 10 carbon atoms; R11 and R12 each independently represent a hydrogen atom, a fluorine atom, a hydrocarbon group having 1 to 10 carbon atoms, or a fluorinated hydrocarbon group having 1 to 10 carbon atoms; n1 represents an integer of 1 to 4, in which, when n1 is 2 or more, a plurality of Rfa's and Rfb's are the same as or different from each other; n2 represents an integer of 0 to 4, in which, when n2 is 2 or more, a plurality of R11's and R12's are the same as or different from each other; no carbonyl group is interposed between a sulfur atom in a sulfonic acid ion and the cyclic structure in RW; and Z+ represents a monovalent onium cation.)
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Inventors:
EGAWA FUYUKI (JP)
FURUKAWA TAIICHI (JP)
FURUKAWA TSUYOSHI (JP)
INAMI HAJIME (JP)
NEMOTO RYUICHI (JP)
FURUKAWA TAIICHI (JP)
FURUKAWA TSUYOSHI (JP)
INAMI HAJIME (JP)
NEMOTO RYUICHI (JP)
Application Number:
PCT/JP2023/003307
Publication Date:
August 17, 2023
Filing Date:
February 02, 2023
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
G03F7/039; C07D307/00; C07D317/72; C07D327/06; C07D493/10; C08F220/18; C09K3/00; G03F7/004; G03F7/038; G03F7/20
Domestic Patent References:
| WO2021070590A1 | 2021-04-15 | |||
| WO2011034176A1 | 2011-03-24 |
Foreign References:
| JP2018189759A | 2018-11-29 |
Attorney, Agent or Firm:
UNIUS PATENT ATTORNEYS OFFICE (JP)
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