Title:
RAPID HEAT TREATMENT APPARATUS FOR CIGS THIN FILM
Document Type and Number:
WIPO Patent Application WO/2016/032047
Kind Code:
A1
Abstract:
The present invention relates to a rapid heat treatment apparatus for a CIGS thin film. The rapid heat treatment apparatus for a CIGS thin film according to the present invention comprises: a load lock chamber into which a carrier box for receiving a precursor thin film formed by sequentially laminating copper, indium, gallium, and selenium is put, and which performs a first selenization process by heating the carrier box while transferring the carrier box in a traveling direction; a heating part which is provided with a plurality of chambers having different internal temperatures, and performs a second selenization process by heating the carrier box while moving the carrier box in a traveling direction, so as to form a CIGS light absorption layer; and a cooling part for cooling the carrier box received from the heating part.
Inventors:
KIM JOO WON (KR)
YOO SANG WOO (KR)
KIM DOHUN (KR)
PARK SANG HYUN (KR)
YOO SANG WOO (KR)
KIM DOHUN (KR)
PARK SANG HYUN (KR)
Application Number:
PCT/KR2014/009234
Publication Date:
March 03, 2016
Filing Date:
September 30, 2014
Export Citation:
Assignee:
SNU PRECISION CO LTD (KR)
International Classes:
H01L31/024; H01L31/0445; H01L31/0749; H01L31/18
Foreign References:
| KR20090100692A | 2009-09-24 | |||
| US20110117693A1 | 2011-05-19 | |||
| KR20120117718A | 2012-10-24 | |||
| US20130067723A1 | 2013-03-21 |
Attorney, Agent or Firm:
CHO, YOUNG HYUN (KR)
์กฐ์ํ (KR)
์กฐ์ํ (KR)
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