Title:
REACTION CHAMBER TURBINE STRUCTURE FOR CHEMICAL VAPOR DEPOSITION (CVD) APPARATUS
Document Type and Number:
WIPO Patent Application WO/2021/227133
Kind Code:
A1
Abstract:
Disclosed is a reaction chamber turbine structure for a chemical vapor deposition (CVD) apparatus, the structure comprising a chamber (1), wherein a rotary support column (4) is provided in the chamber; a plurality of blades (3) are provided on the rotary support column; each blade is provided with a recess, and a wafer is mounted by means of the recess; a gas diversion plate (6) is provided on the rotary support column and below the blades, and is provided with a plurality of diversion holes (8); and the bottom of the chamber is provided with an exhaust hole (7) in communication with a tail gas system. The structure can improve process stability.
Inventors:
LIU ZIYOU (CN)
XIAO YUNZHANG (CN)
ZHONG GUOFANG (CN)
CHEN BINGAN (CN)
ZHANG CAN (CN)
XIAO YUNZHANG (CN)
ZHONG GUOFANG (CN)
CHEN BINGAN (CN)
ZHANG CAN (CN)
Application Number:
PCT/CN2020/092746
Publication Date:
November 18, 2021
Filing Date:
May 28, 2020
Export Citation:
Assignee:
SHENZHEN NASO TECH CO LTD (CN)
International Classes:
C23C16/458
Domestic Patent References:
| WO2014104551A1 | 2014-07-03 |
Foreign References:
| JPS6090894A | 1985-05-22 | |||
| CN103930594A | 2014-07-16 | |||
| CN110172677A | 2019-08-27 | |||
| CN110684962A | 2020-01-14 | |||
| CN102817012A | 2012-12-12 | |||
| CN101243203A | 2008-08-13 | |||
| JPS60194077A | 1985-10-02 |
Attorney, Agent or Firm:
BEIJING KUAIZHIHUI IP AGENCY CO., LTD. (CN)
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