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Patent Searching and Data


Title:
RECOVERY METHOD FOR HIGH PURITY PLATINUM
Document Type and Number:
WIPO Patent Application WO/2012/029379
Kind Code:
A1
Abstract:
A high purity platinum recovery method for obtaining a platinum sponge by dissolving a platinum alloy containing ruthenium in aqua regia, removing the residue and then reacting the acid wherein platinum is dissolved and an ammonium chloride solution, separating out cholorplatanic acid ammonium, and reducing the chloroplatanic acid ammonium. The method is characterised in that the acid wherein the platinum is dissolved and the ammonium chloride solution are reacted at a temperature of at least 40˚C. Provided is a method which enables the recovery of a high yield of high purity platinum which can be reused in platinum and platinum alloy-containing targets and from which ruthenium, cobalt, chromium, copper, iron, nickel, and silicon, etcetera, mixed into scraps such as mill ends, sawdust, or surface grinding scraps generated in the manufacturing process or similar for a target or in used platinum alloy sputtering targets, particularly magnetic targets, have been efficiently removed.

Inventors:
SEKIGUCHI JUNNOSUKE (JP)
Application Number:
PCT/JP2011/064096
Publication Date:
March 08, 2012
Filing Date:
June 21, 2011
Export Citation:
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Assignee:
JX NIPPON MINING & METALS CORP (JP)
SEKIGUCHI JUNNOSUKE (JP)
International Classes:
C22B5/02; C22B11/00; C22B7/00
Foreign References:
JP2009144183A2009-07-02
JPH09316560A1997-12-09
JP2006183099A2006-07-13
JPS5322114A1978-03-01
JP2010222613A2010-10-07
Attorney, Agent or Firm:
OGOSHI ISAMU (JP)
Isamu Ogoshi (JP)
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Claims: