REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, AND REFLECTIVE MASK MANUFACTURING METHOD

Title:

REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK BLANK MANUFACTURING METHOD, AND REFLECTIVE MASK MANUFACTURING METHOD

Document Type and Number:

WIPO Patent Application WO/2024/009819

Kind Code:

A1

Abstract:

This reflective mask blank comprises, in the stated order, a substrate, a multi-layered reflective film that reflects EUV light, a protective film that protects the multi-layered reflective film, and a phase shift film that shifts the phase of the EUV light. The phase shift film is formed from an Ir-based material mainly containing Ir. The protective film is formed from a Rh-based material mainly containing Rh.

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Inventors:

NAGATA YUYA (JP)
AKAGI DAIJIRO (JP)
SASAKI KENICHI (JP)
IWAOKA HIROAKI (JP)

Application Number:

PCT/JP2023/023537

Publication Date:

January 11, 2024

Filing Date:

June 26, 2023

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Assignee:

AGC INC (JP)

International Classes:

G03F1/24

Domestic Patent References:

WO2022118762A1	2022-06-09
WO2021132111A1	2021-07-01

Foreign References:

US20210341828A1	2021-11-04
JP2021101258A	2021-07-08

Attorney, Agent or Firm:

ITOH, Tadashige et al. (JP)

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