Title:
REGENERATION METHOD FOR ACID-GAS ADSORPTION DEVICE, AND MANUFACTURING METHOD FOR ACID-GAS ADSORPTION DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/195388
Kind Code:
A1
Abstract:
Provided are: a regeneration method for an acid-gas adsorption device, the method enabling smooth recovery of acid-gas recovery performance and reduced running costs; and a manufacturing method for an acid-gas adsorption device, the method enabling the manufacture of an acid-gas adsorption device having a superior acid-gas recovery performance. A regeneration method for an acid-gas adsorption device according to an embodiment of the present invention includes: a step in which a gas including an acid gas is supplied to the acid-gas adsorption device so as to contact an acid-gas adsorption layer, causing an acid gas adsorbent to adsorb the acid gas; a step in which the acid gas is desorbed from the acid gas adsorbent; a step in which, after undergoing the step of adsorbing the acid gas and the step of desorbing the acid gas, the acid-gas adsorption layer of the acid-gas adsorption device is removed from the surface of a base material; and a step in which an acid-gas adsorption layer, which includes a porous carrier and the acid gas adsorbent, is formed on the surface of the base material from which the acid-gas adsorption layer has been removed.
Inventors:
OKUMA YUSUKE (JP)
SHIBAGAKI YUKINARI (JP)
KAN HIROFUMI (JP)
IIDA KAZUKI (JP)
TORII ATSUSHI (JP)
NAKAGAWA KOSUKE (JP)
SHIBAGAKI YUKINARI (JP)
KAN HIROFUMI (JP)
IIDA KAZUKI (JP)
TORII ATSUSHI (JP)
NAKAGAWA KOSUKE (JP)
Application Number:
PCT/JP2023/012499
Publication Date:
October 12, 2023
Filing Date:
March 28, 2023
Export Citation:
Assignee:
NGK INSULATORS LTD (JP)
International Classes:
B01D53/04; B01D53/14; C01B32/50
Domestic Patent References:
WO2021111366A1 | 2021-06-10 |
Foreign References:
JP2002153718A | 2002-05-28 | |||
JP2002153717A | 2002-05-28 |
Attorney, Agent or Firm:
MOMII Takafumi (JP)
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