RELEASING FILM

WIPO Patent Application WO/2014/156662

A1

This releasing film comprises a base and a releasing layer which is formed from a material that contains (A) an active energy ray curable composition having at least one functional group that is selected from the group consisting of a (meth)acryloyl group, an alkenyl group and a maleimide group and (B) an active energy ray curable composition that has a fluorine atom in each molecule, while having at least one functional group that is selected from the group consisting of (meth)acryloyl group, an alkenyl group and a maleimide group. The arithmetic average roughness of the outer surface of the releasing layer is 8 nm or less, and the maximum profile peak height of the outer surface of the releasing layer is 50 nm or less. The arithmetic average roughness of a second surface of the base is 5-40 nm, and the maximum profile peak height of the second surface of the base is 60-500 nm. The present invention is able to provide a releasing film which has excellent releasability and excellent blocking resistance, and which prevents the formation of pin holes and the occurrence of partial thickness variation in a thin film such as a green sheet during the formation of the thin film.

ICHIKAWA SHINYA (JP)
FUKAYA TOMOMI (JP)

PCT/JP2014/056556

October 02, 2014

March 12, 2014

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LINTEC CORP (JP)

B32B27/00; B32B27/30; C08F290/06; C08J7/043; C09D4/02; C09D127/12

JP2002302645A	2002-10-18
JP2012224011A	2012-11-15
JP2003291291A	2003-10-14
JP2007069360A	2007-03-22
JP2003238894A	2003-08-27
JP2009083271A	2009-04-23

ASAHI, Kazuo et al. (JP)
Morning ratio One husband (JP)

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