Title:
REMOVAL OF MASKING MATERIAL
Document Type and Number:
WIPO Patent Application WO/2011/072188
Kind Code:
A3
Abstract:
Methods for removing a masking material, for example, a photoresist, and electronic devices formed by removing a masking material are presented. For example, a method for removing a masking material includes contacting the masking material with a solution comprising cerium and at least one additional oxidant. The cerium may be comprised in a salt. The salt may be cerium ammonium nitrate. The at least one additional oxidant may be a manganese, ruthenium, and/or osmium-containing compound.
Inventors:
AFZALI-ARDAKANI ALI (US)
BAUM THOMAS H (US)
BOGGS KARL E (US)
COOPER EMANUEL I (US)
CYWAR DOUGLAS (US)
KERN MATTHEW (US)
KHOJASTEH MAHMOUD (US)
TOTIR GEORGE GABRIEL (US)
BAUM THOMAS H (US)
BOGGS KARL E (US)
COOPER EMANUEL I (US)
CYWAR DOUGLAS (US)
KERN MATTHEW (US)
KHOJASTEH MAHMOUD (US)
TOTIR GEORGE GABRIEL (US)
Application Number:
PCT/US2010/059800
Publication Date:
September 15, 2011
Filing Date:
December 10, 2010
Export Citation:
Assignee:
ADVANCED TECH MATERIALS (US)
IBM (US)
AFZALI-ARDAKANI ALI (US)
BAUM THOMAS H (US)
BOGGS KARL E (US)
COOPER EMANUEL I (US)
CYWAR DOUGLAS (US)
KERN MATTHEW (US)
KHOJASTEH MAHMOUD (US)
NUNES RONALD W (US)
TOTIR GEORGE GABRIEL (US)
IBM (US)
AFZALI-ARDAKANI ALI (US)
BAUM THOMAS H (US)
BOGGS KARL E (US)
COOPER EMANUEL I (US)
CYWAR DOUGLAS (US)
KERN MATTHEW (US)
KHOJASTEH MAHMOUD (US)
NUNES RONALD W (US)
TOTIR GEORGE GABRIEL (US)
International Classes:
H01L21/3063
Foreign References:
| US6162565A | 2000-12-19 | |||
| US20020077259A1 | 2002-06-20 | |||
| US20030003754A1 | 2003-01-02 | |||
| JP2002064101A | 2002-02-28 |
Other References:
See also references of EP 2510538A4
Attorney, Agent or Firm:
FUIERER, Tristan (P.O. Box 13706Research Triangle Park, NC, US)
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