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Title:
REPAIR METHOD FOR SEPARATION MEMBRANE AND METHOD FOR MANUFACTURING SEPARATION MEMBRANE STRUCTURE
Document Type and Number:
WIPO Patent Application WO/2017/086084
Kind Code:
A1
Abstract:
A repair method for a separation membrane (30) comprises a step for adhesion of a colloidal solution with a prescribed pH, wherein repair material particles are dispersed in an aqueous solvent, to the surface of the separation membrane (30) formed on a support (20). At the prescribed pH, the repair material particles have an electrical charge opposite to that of the support (20).

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Inventors:
YAMAZAKI SHINICHIRO (JP)
HAGIO TAKESHI (JP)
NODA KENICHI (JP)
Application Number:
PCT/JP2016/081077
Publication Date:
May 26, 2017
Filing Date:
October 20, 2016
Export Citation:
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Assignee:
NGK INSULATORS LTD (JP)
International Classes:
B01D71/02; B01D65/10; B01D69/10
Domestic Patent References:
WO2014156579A12014-10-02
WO2014069676A12014-05-08
Foreign References:
JP2010506700A2010-03-04
JP2003290636A2003-10-14
JP2000507909A2000-06-27
JP2009520594A2009-05-28
JP2013059714A2013-04-04
JP2011016114A2011-01-27
JP2010511512A2010-04-15
JP2005288266A2005-10-20
Attorney, Agent or Firm:
SHINJYU GLOBAL IP (JP)
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