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Title:
RESIN COMPOSITION, RESIN ADDITIVE COMPOSITION, RESIN STRUCTURE, METHOD FOR IMPROVING WEATHER RESISTANCE, METHOD FOR PRODUCING RESIN COMPOSITION, AND HINDERED AMINE PHOTOSTABILIZER
Document Type and Number:
WIPO Patent Application WO/2023/199980
Kind Code:
A1
Abstract:
A resin composition according to the present invention contains a synthetic resin, a hindered amine photostabilizer, and a photocatalyst, the photocatalyst content being at least 0.001 part by mass and less than 0.5 part by mass per 100 parts by mass of synthetic resin.

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Inventors:
UEDA MARINA (JP)
HIDANO TOMOHIRO (JP)
UEDA NAOTO (JP)
Application Number:
PCT/JP2023/015036
Publication Date:
October 19, 2023
Filing Date:
April 13, 2023
Export Citation:
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Assignee:
ADEKA CORP (JP)
International Classes:
C08L101/00; C08K3/22; C08K5/3432
Foreign References:
JP2006199914A2006-08-03
JP2001342362A2001-12-14
Attorney, Agent or Firm:
HAYAMI Shinji (JP)
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