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Title:
RESIN COMPOSITION, CURED PRODUCT, UV ABSORBER, UV CUT FILTER, LENS, PROTECTIVE MATERIAL, COMPOUND, AND METHOD FOR SYNTHESIZING COMPOUND
Document Type and Number:
WIPO Patent Application WO/2021/131355
Kind Code:
A1
Abstract:
This resin composition contains the compound represented by formula (1), and a resin. R1 and R2 in formula (1) independently represent an alkyl group, etc., R3 and R6 independently represent an alkoxy group, R4 represents an alkyl group, an aryl group, an alkoxy group, an aryloxy group, etc., and R5 represents a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, etc. A cured product, a UV absorber, a UV cut filter, a lens, a protective material, a compound, and a method for synthesizing the compound are also provided.

Inventors:
FURUYAMA HIDETOMO (JP)
SASAKI DAISUKE (JP)
JIMBO YOSHIHIRO (JP)
KUWAHARA HIROKI (JP)
Application Number:
PCT/JP2020/041670
Publication Date:
July 01, 2021
Filing Date:
November 09, 2020
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
C08L101/00; C07D409/04; C08K5/45; F21V5/00; F21V9/06
Domestic Patent References:
WO2019159570A12019-08-22
WO2019159570A12019-08-22
WO2019142539A12019-07-25
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"The Fourth Series of Experimental Chemistry 29 Polymer Material", 1992, CHEMICAL SOCIETY OF JAPAN, pages: 225 - 232
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, vol. 131, no. 33, 2009, pages 11875 - 11881
Attorney, Agent or Firm:
SIKs & Co. (JP)
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