Title:
RESIN COMPOSITION FOR FILM, FILM PRODUCTION METHOD, AND FILM
Document Type and Number:
WIPO Patent Application WO/2020/195377
Kind Code:
A1
Abstract:
Provided are: a resin composition which is for a film and from which a film having good haze and/or smoothness can be produced by improving drying-promoting properties, peelability of a support body, and sticking properties between films while suppressing the occurrence of equipment trouble; a film production method; and a film. This resin composition (dope (21)) for a film contains: a resin (11) having an aromatic ring and/or an imide ring in the main chain thereof, having a glass transition temperature of 170 °C or higher, and being dissolved in a concentration of 10 mass% or more with respect to methylene chloride; a citric acid ester (12) having carboxylic residues and alcohol residues having 3 to 5 carbon atoms; the methylene chloride; and a monovalent alcohol having 1 to 3 carbon atoms.
Inventors:
ISHII EIJI (JP)
KATANO SHOGO (JP)
KATANO SHOGO (JP)
Application Number:
PCT/JP2020/006595
Publication Date:
October 01, 2020
Filing Date:
February 19, 2020
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C08K5/05; C08J5/18; C08K3/36; C08K5/11; C08K9/06; C08L67/03; C08L79/08; C08L101/02
Domestic Patent References:
| WO2009147997A1 | 2009-12-10 |
Foreign References:
| JP2018065259A | 2018-04-26 | |||
| JP2017187617A | 2017-10-12 | |||
| JP2013185128A | 2013-09-19 | |||
| JP2019065103A | 2019-04-25 |
Attorney, Agent or Firm:
KYORITSU INSTITUTE (JP)
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