Title:
RESIN COMPOSITION FOR STEREOLITHOGRAPHY, METHOD FOR PRODUCING STEREOLITHOGRAM, AND INORGANIC FILLER PARTICLES
Document Type and Number:
WIPO Patent Application WO/2016/076180
Kind Code:
A1
Abstract:
Provided is a resin composition for stereolithography to which an adequate amount of inorganic filler particles can be added without diminishing transparency. A resin composition for stereolithography that includes a curable resin and inorganic filler particles, wherein the resin composition is characterized in that the inorganic filler particles are translucent particles in which the difference in refractive index nd with respect to the curable resin after curing is ±0.02 or less, and the difference in Abbe number vd with respect to the curable resin after curing is ±10 or less.
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Inventors:
MATANO TAKAHIRO (JP)
FUJITA SHUNSUKE (JP)
NAKANE SHINGO (JP)
ISHIDA YUJI (JP)
YAMAZAKI YOSHINORI (JP)
FUJITA SHUNSUKE (JP)
NAKANE SHINGO (JP)
ISHIDA YUJI (JP)
YAMAZAKI YOSHINORI (JP)
Application Number:
PCT/JP2015/081073
Publication Date:
May 19, 2016
Filing Date:
November 04, 2015
Export Citation:
Assignee:
NIPPON ELECTRIC GLASS CO (JP)
International Classes:
B29C67/00; C08F2/44; B33Y10/00; B33Y70/00
Foreign References:
| JP2011105555A | 2011-06-02 | |||
| JP2006312706A | 2006-11-16 | |||
| JP2008308629A | 2008-12-25 | |||
| JPH0820620A | 1996-01-23 | |||
| JPH07228644A | 1995-08-29 | |||
| JP2008224804A | 2008-09-25 | |||
| JP2007153729A | 2007-06-21 | |||
| JP2013067519A | 2013-04-18 |
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