Title:
RESIN COMPOSITION FOR THERMOSETTING PHOTO-ALIGNMENT FILMS
Document Type and Number:
WIPO Patent Application WO/2023/157934
Kind Code:
A1
Abstract:
[Problem] To provide a resin composition for thermosetting photo-alignment films, the resin composition having improved post exposure stability and providing an alignment material that exhibits excellent alignment sensitivity and excellent alignment properties. [Solution] A resin composition for thermosetting photo-alignment films, the resin composition containing (D) a crosslinking catalyst which is a polymerization product that has a weight average molecular weight within the range from 500 to 1,000,000, while comprising a sulfonic acid group or a structure that is thermally decomposed and generates an acid, or a crosslinking catalyst which is a compound that has a sulfonic acid group or a structure that is thermally decomposed and generates an acid, while having one or more polar groups other than the sulfonic acid group. In addition, this resin composition for thermosetting photo-alignment films contains, if necessary: (A) a compound which has a photo-alignment group and one substituent that is selected from the group consisting of a hydroxy group, a carboxy group, an amino group and an epoxy group; (B) a hydrophilic polymer which has one or more substituents that are selected from the group consisting of a hydroxy group, a carboxy group and an amino group; (C) a crosslinking agent which has an N-hydroxymethyl group or an N-alkoxymethyl group; and a solvent. A cured film is formed using this resin composition for thermosetting photo-alignment films, and an alignment material is formed by utilizing photo-alignment technology. A retardation material is obtained by applying a polymerizable liquid crystal onto the alignment material, and curing the polymerizable liquid crystal thereon.
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Inventors:
INOUE SHOTA (JP)
NISHIMURA NAOYA (JP)
NISHIMURA NAOYA (JP)
Application Number:
PCT/JP2023/005541
Publication Date:
August 24, 2023
Filing Date:
February 16, 2023
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C08K5/00; G02B5/30; C08L57/10; C08L57/12; C08L101/06; C08L101/12; G02F1/13363; G02F1/1337
Domestic Patent References:
| WO2015129890A1 | 2015-09-03 | |||
| WO2020153311A1 | 2020-07-30 | |||
| WO2008056597A1 | 2008-05-15 |
Foreign References:
| JP2012103506A | 2012-05-31 | |||
| JP2014012823A | 2014-01-23 | |||
| JP2011186387A | 2011-09-22 | |||
| US20170362381A1 | 2017-12-21 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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