Title:
RESIN MATERIAL, VINYL BAG, POLYCRYSTALLINE SILICON ROD, POLYCRYSTALLINE SILICON MASS
Document Type and Number:
WIPO Patent Application WO/2017/047260
Kind Code:
A1
Abstract:
According to the present invention, a resin material that consistently has the following surface concentrations of impurities is used in the production of polycrystalline silicon. Values obtained from quantitative analysis by ICP mass spectrometry using a 1 wt% nitric acid aqueous solution as an extraction liquid: a phosphorous (P) concentration of 50 pptw or less; an arsenic (As) concentration of 2 pptw or less; a boron (B) concentration of 20 pptw or less; an aluminum (Al) concentration of 10 pptw or less; a total of iron (Fe), chromium (Cr), nickel (Ni), copper (Cu), sodium (Na), and zinc (Zn) of 80 pptw or less; a total of lithium (Li), potassium (K), calcium (Ca), titanium (Ti), manganese (Mn), cobalt (Co), molybdenum (Mo), tin (Sn), tungsten (W), and lead (Pb) of 100 pptw or less.
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Inventors:
MIYAO SHUICHI (JP)
NETSU SHIGEYOSHI (JP)
WATANABE KAZUNORI (JP)
NETSU SHIGEYOSHI (JP)
WATANABE KAZUNORI (JP)
Application Number:
PCT/JP2016/072596
Publication Date:
March 23, 2017
Filing Date:
August 02, 2016
Export Citation:
Assignee:
SHINETSU CHEMICAL CO (JP)
International Classes:
C08J7/00; B65D30/02; B65D65/38; C01B33/02
Foreign References:
| JP2015073947A | 2015-04-20 | |||
| JP2001220446A | 2001-08-14 | |||
| JPH04175350A | 1992-06-23 | |||
| JP2013151413A | 2013-08-08 |
Attorney, Agent or Firm:
OHNO, Seiji et al. (JP)
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