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Title:
RESIST COMPOSITION CONTAINING COBALT DYE AND COLOR FILTER USING SAME
Document Type and Number:
WIPO Patent Application WO/2006/043442
Kind Code:
A1
Abstract:
Disclosed is a color resist composition with high resolution which leaves no development residue. Also disclosed is a color filter using such a color resist composition. Specifically disclosed is a resist composition including a cobalt-containing complex salt dye. Also specifically disclosed is a resist composition wherein a compound having a complex salt-forming ability in a complex salt dye has a dihydroxyazo structure represented by the following formula (1): HO-X-N=N-X-OH (wherein X represent an organic group derived from a substituted or unsubstituted cyclic compound). Further specifically disclosed is a resist composition wherein a compound having a complex salt-forming ability in a complex salt dye has a pyrazole-azo structure represented by the following formula (2).

Inventors:
YAMADA MARIKO (JP)
MAEDA SEISUKE (JP)
HOSAKA KAZUYOSHI (JP)
SUZUKI MASAYOSHI (JP)
Application Number:
PCT/JP2005/018687
Publication Date:
April 27, 2006
Filing Date:
October 11, 2005
Export Citation:
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Assignee:
NISSAN CHEMICAL IND LTD (JP)
YAMADA MARIKO (JP)
MAEDA SEISUKE (JP)
HOSAKA KAZUYOSHI (JP)
SUZUKI MASAYOSHI (JP)
International Classes:
G03F7/004; C08F2/50; C09B45/14; C09B45/20; C09B69/04; G02B5/20; G03F7/038
Foreign References:
JP2002351061A2002-12-04
JPS62111249A1987-05-22
JP2003246148A2003-09-02
JP2004029518A2004-01-29
JPH0358002A1991-03-13
Attorney, Agent or Firm:
Hanabusa, Tsuneo c/o Hanabusa, Patent Office (Shin-Ochanomizu Urban Trinity 2, Kandasurugadai 3-chom, Chiyoda-ku Tokyo, JP)
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