Title:
RESIST COMPOSITION, RESIST FILM, MASK BLANK, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/104355
Kind Code:
A1
Abstract:
The present invention provides: a resist composition which contains a resin (P) that has a repeating unit (a) having an inner salt structure; a resist film which is formed from this resist composition; a mask blank; a pattern forming method which uses this resist composition; and a method for manufacturing an electronic device, which comprises this pattern forming method.
Inventors:
TAKADA AKIRA (JP)
TSUCHIMURA TOMOTAKA (JP)
TSUCHIMURA TOMOTAKA (JP)
Application Number:
PCT/JP2016/084490
Publication Date:
June 22, 2017
Filing Date:
November 21, 2016
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/039; C08F246/00; G03F7/004; G03F7/038; G03F7/20
Foreign References:
| JP2014001259A | 2014-01-09 | |||
| JP2012083387A | 2012-04-26 | |||
| JP2015071743A | 2015-04-16 | |||
| JP2015143330A | 2015-08-06 | |||
| JP2013083929A | 2013-05-09 | |||
| JP2011157313A | 2011-08-18 |
Attorney, Agent or Firm:
TAKAMATSU Takeshi et al. (JP)
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