Title:
RESIST COMPOSITION FOR IMMERSION EXPOSURE, AND METHOD FOR FORMATION OF RESIST PATTERN
Document Type and Number:
WIPO Patent Application WO/2007/138873
Kind Code:
A1
Abstract:
Disclosed is a resist composition for immersion exposure, comprising: a resin
component (A) whose alkali solubility can be changed by the action of an acid;
and an acid-generator component (B) which can generate an acid upon being exposed
to light, wherein the acid-generator component (B) comprises an acid-generator
(B1) having a cationic moiety represented by the general formula (b1-1). (b1-1)
wherein R42 and R43 independently represent an alkyl group,
an alkoxy group or a hydroxyl group; and n2 and n3 independently
represent an integer ranging from 0 to 2.
Inventors:
UTSUMI YOSHIYUKI (JP)
Application Number:
PCT/JP2007/060134
Publication Date:
December 06, 2007
Filing Date:
May 17, 2007
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
UTSUMI YOSHIYUKI (JP)
UTSUMI YOSHIYUKI (JP)
International Classes:
G03F7/004; C07C381/12; C08F220/28; G03F7/039; H01L21/027
Domestic Patent References:
| WO2005003858A2 | 2005-01-13 | |||
| WO2006008914A1 | 2006-01-26 |
Attorney, Agent or Firm:
TANAI, Sumio et al. (YaesuChuo-ku, Tokyo 53, JP)
Download PDF:
Previous Patent: IMAGE PROCESSING DEVICE CONTROL METHOD AND IMAGE PROCESSING DEVICE
Next Patent: VOICE CONFERENCE DEVICE
Next Patent: VOICE CONFERENCE DEVICE