Title:
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND ACID DIFFUSION CONTROL AGENT
Document Type and Number:
WIPO Patent Application WO/2024/095868
Kind Code:
A1
Abstract:
The present invention provides a resist composition which generates an acid by being exposed to light, and the solubility of which in a developer solution is changed by the action of an acid. This resist composition contains: a resin component (A1), the solubility of which in a developer solution is changed by the action of an acid; and a compound (D0) which is represented by general formula (d0). In the formula, Rd01 represents a monovalent organic group; Rd02 represents a monovalent organic group or a hydrogen atom; and Ld01 represents a single bond or a divalent linking group.
Inventors:
MATSUSHITA TETSUYA (JP)
INARI TAKATOSHI (JP)
INARI TAKATOSHI (JP)
Application Number:
PCT/JP2023/038552
Publication Date:
May 10, 2024
Filing Date:
October 25, 2023
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
G03F7/004; C07C281/02; C07C323/20; C07D307/91; C09K3/00; G03F7/038; G03F7/039; G03F7/20
Foreign References:
| JPH07219217A | 1995-08-18 | |||
| JPH08286367A | 1996-11-01 | |||
| JP2015087749A | 2015-05-07 |
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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