Title:
RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID GENERATION AGENT
Document Type and Number:
WIPO Patent Application WO/2023/162907
Kind Code:
A1
Abstract:
This resist composition includes a base component (A) and a compound (B0) represented by general formula (b0). In the formula, Ar0 is an arylene group or a hetero arylene group. Rm1 and Rm2 are substituents other than an iodine atom. L01 is a divalent linking group or a single bond. L02 is a divalent linking group. Vb0 is a single bond or the like. R0 is a hydrogen atom or the like. nb1 is an integer from 2 to 4, nb2 is an integer from 1 to 3, and nb3 is an integer from 0 to 2. nb4 is an integer from 0 and above, and nb5 is an integer from 1 and above. Mm+ denotes an organic cation having a valency of m. m is an integer of 1 and above.
Inventors:
NGUYEN KHANHTIN (JP)
SUZUKI ISSEI (JP)
KATO HIROKI (JP)
SUZUKI ISSEI (JP)
KATO HIROKI (JP)
Application Number:
PCT/JP2023/005907
Publication Date:
August 31, 2023
Filing Date:
February 20, 2023
Export Citation:
Assignee:
TOKYO OHKA KOGYO CO LTD (JP)
International Classes:
G03F7/004; C07C309/12; C07C381/12; C07D333/76; C09K3/00; G03F7/039; G03F7/20
Foreign References:
| JP2020181064A | 2020-11-05 | |||
| JP2019061217A | 2019-04-18 | |||
| JP2018025789A | 2018-02-15 | |||
| JP2018005224A | 2018-01-11 |
Attorney, Agent or Firm:
TAZAKI Akira et al. (JP)
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