Title:
RESIST MATERIAL, AND RESIST MATERIAL FOR ELECTRON BEAM RECORDING
Document Type and Number:
WIPO Patent Application WO/2006/129565
Kind Code:
A1
Abstract:
This invention generally provides a resist material that has high sensitivity to light and electron beams and can form a clear and fine pattern at a smaller exposure. The resist material comprises a metal compound and is characterized in that a metal element constituting the metal compound is a group 14 or 15 metal element and the metal compound is a stoichiometrically incomplete compound.
Inventors:
HOSODA YASUO (JP)
Application Number:
PCT/JP2006/310552
Publication Date:
December 07, 2006
Filing Date:
May 26, 2006
Export Citation:
Assignee:
PIONEER CORP (JP)
HOSODA YASUO (JP)
HOSODA YASUO (JP)
International Classes:
G03F7/004; G03F7/11; H01L21/027
Foreign References:
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| JPS5619045A | 1981-02-23 | |||
| JPS56144536A | 1981-11-10 | |||
| JPH05263218A | 1993-10-12 | |||
| JPH05212967A | 1993-08-24 | |||
| JP2004090610A | 2004-03-25 | |||
| JPS637978A | 1988-01-13 | |||
| JPH09311439A | 1997-12-02 | |||
| JP2001135563A | 2001-05-18 | |||
| JP2003315988A | 2003-11-06 | |||
| JP2004152465A | 2004-05-27 | |||
| JP2004348830A | 2004-12-09 | |||
| JPH03129349A | 1991-06-03 | |||
| JP2004504633A | 2004-02-12 | |||
| JP2006116948A | 2006-05-11 | |||
| JP2006004594A | 2006-01-05 |
Attorney, Agent or Firm:
Yamashita, Akihiko c/o Tokyo, Central Patent Firm (3rd Floor Oak Building Kyobashi, 16-10,
Kyobashi 1-chome, Chuou-k, Tokyo 31, JP)
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