Title:
RESIST STRIPPING SOLUTION
Document Type and Number:
WIPO Patent Application WO/2020/194419
Kind Code:
A1
Abstract:
Due to the implementation of high-definition broadcast formats such as 4K and 8K, television screens are becoming larger, and consequently, to prevent a failure from occurring during element forming, photoresist baking temperatures are being raised, leading to the photoresists becoming difficult to strip. Large amounts of resist stripping solution are being used, so in order to lower the costs thereof, a resist stripping solution having a high regeneration rate is sought. The invention provides a resist stripping solution enabling stripping of a hard-baked resist and capable of regeneration by distillation.
The resist stripping solution is characterized by comprising: a tertiary polyamine compound; at least one type selected from, as a straight-chain amide, N-methyl formamide, N,N-dimethyl formamide, N,N-diethyl formamide, N,N-dimethyl acetamide, and N,N-diethyl acetamide; a polar solvent comprising 2-pyrrolidone and water; and 0.0001 to 0.01% by mass of a metal surface protectant. The straight chain amide content is greater than the 2-pyrrolidone content.
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Inventors:
FUCHIGAMI SHINICHIROU
KITO YUSUKE
KITO YUSUKE
Application Number:
PCT/JP2019/012337
Publication Date:
October 01, 2020
Filing Date:
March 25, 2019
Export Citation:
Assignee:
PANASONIC IP MAN CO LTD (JP)
International Classes:
G03F7/42
Domestic Patent References:
| WO2018061065A1 | 2018-04-05 |
Foreign References:
| JP2008003594A | 2008-01-10 | |||
| JP2012118368A | 2012-06-21 | |||
| JP2016109870A | 2016-06-20 | |||
| KR20100011472A | 2010-02-03 |
Attorney, Agent or Firm:
HIROKOH Masaki (JP)
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