Title:
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PRODUCT OF HYDANTOIN COMPOUNDS
Document Type and Number:
WIPO Patent Application WO/2022/025090
Kind Code:
A1
Abstract:
The present invention provides: a composition for forming a resist underlayer film that enables the formation of a desired resist pattern; and a method for producing a resist pattern and a method for producing a semiconductor device, each of which uses the resist underlayer film-forming composition. The resist underlayer film-forming composition comprises an organic solvent and the reaction product of (A) a hydantoin-containing compound that has two epoxy groups and (B) a hydantoin-containing compound different from (A). This reaction product is preferably the reaction product of a secondary amino group present in the hydantoin-containing compound (B) and the epoxy group present in the hydantoin-containing compound (A).
More Like This:
Inventors:
MIZUOCHI RYUTA (JP)
KATO YUKI (JP)
TAMURA MAMORU (JP)
KATO YUKI (JP)
TAMURA MAMORU (JP)
Application Number:
PCT/JP2021/027814
Publication Date:
February 03, 2022
Filing Date:
July 28, 2021
Export Citation:
Assignee:
NISSAN CHEMICAL CORP (JP)
International Classes:
C08G73/00; G03F7/11; G03F7/20; H01L21/027
Domestic Patent References:
| WO2015163195A1 | 2015-10-29 | |||
| WO2020071361A1 | 2020-04-09 |
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
Download PDF: