Title:
RESISTIVITY MEASUREMENT DEVICE MANAGEMENT METHOD
Document Type and Number:
WIPO Patent Application WO/2020/246138
Kind Code:
A1
Abstract:
The present invention pertains to a method for managing a resistivity measurement device by repeatedly measuring, by a four-probe method, resistivity on a measurement surface of a standard sample comprising a silicon monocrystal, the method involving: using a standard sample in which the measurement surface is a plane orthogonal to the center axis of a silicon ingot and which includes, in the in-plane of the measurement surface, an intersection point between the center axis of the silicon ingot and the plane orthogonal to the center axis; arranging four probes for use in the four-probe method such that the array direction thereof is orthogonal to a straight line connecting the intersection point and a measurement position; measuring the resistivity by means of the four-probe method; and rotationally moving the measurement position by a prescribed rotational angle about the intersection point for each measurement. Thus, it is possible to provide a resistivity measurement device management method which can achieve stabilization of repetitive resistivity measurement of a silicon monocrystal which is a standard sample.
Inventors:
YOSHIDA MASAHIRO (JP)
FUKUYAMA MITSUHIRO (JP)
KUME FUMITAKA (JP)
KANAYA KOICHI (JP)
FUKUYAMA MITSUHIRO (JP)
KUME FUMITAKA (JP)
KANAYA KOICHI (JP)
Application Number:
PCT/JP2020/016069
Publication Date:
December 10, 2020
Filing Date:
April 10, 2020
Export Citation:
Assignee:
SHINETSU HANDOTAI KK (JP)
International Classes:
G01R27/02; H01L21/66
Foreign References:
| JP2011211060A | 2011-10-20 |
Attorney, Agent or Firm:
YOSHIMIYA Mikio et al. (JP)
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