Title:
SCANNING ELECTRON MICROSCOPE
Document Type and Number:
WIPO Patent Application WO/2012/042738
Kind Code:
A1
Abstract:
Provided is a scanning electron microscope equipped with a high-speed and high-precision astigmatism measuring means to be used when both astigmatism generated by an electron-beam mirror body and astigmatism generated from the surroundings of a measuring sample exist. This scanning electron microscope is characterized in controlling an astigmatism corrector (201) with high-speed and high-precision, to correct the astigmatism, by using both a method of obtaining the astigmatism from the qualities of two-dimensional images to be acquired upon changing the intensity of the astigmatism corrector (201), and a method of measuring the astigmatism from the change in the position deviation of an electron beam that occurs when the electron beam is tilted using a tilt deflector (202).
Inventors:
SOHDA YASUNARI (JP)
YAMANASHI HIROMASA (JP)
FUKUDA MUNEYUKI (JP)
OHASHI TAKEYOSHI (JP)
KOMURO OSAMU (JP)
YAMANASHI HIROMASA (JP)
FUKUDA MUNEYUKI (JP)
OHASHI TAKEYOSHI (JP)
KOMURO OSAMU (JP)
Application Number:
PCT/JP2011/004749
Publication Date:
April 05, 2012
Filing Date:
August 26, 2011
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
SOHDA YASUNARI (JP)
YAMANASHI HIROMASA (JP)
FUKUDA MUNEYUKI (JP)
OHASHI TAKEYOSHI (JP)
KOMURO OSAMU (JP)
SOHDA YASUNARI (JP)
YAMANASHI HIROMASA (JP)
FUKUDA MUNEYUKI (JP)
OHASHI TAKEYOSHI (JP)
KOMURO OSAMU (JP)
International Classes:
H01J37/153; H01J37/21; H01J37/28
Domestic Patent References:
| WO2010035416A1 | 2010-04-01 |
Foreign References:
| JP2003016983A | 2003-01-17 | |||
| JP2005122933A | 2005-05-12 |
Attorney, Agent or Firm:
INOUE, Manabu et al. (JP)
Manabu Inoue (JP)
Manabu Inoue (JP)
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Claims: