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Title:
SCREEN PRINTING SYSTEM AND METHOD FOR CLEANING MASKS OF SCREEN PRINTING SYSTEM
Document Type and Number:
WIPO Patent Application WO/2011/074239
Kind Code:
A1
Abstract:
Disclosed are a screen printing system and a method for cleaning masks of the screen printing system that can sufficiently clean the masks used in screen printing of a cavity substrate. The mask-contact region (R) of a paper member (42) is caused to contact the bottom surface of one of the convex sections (13t) of a first mask (13a), and after eliminating paste (Pst) adhered to that portion, and during the period until the paper member (42) contacts the next convex section (13t) from which paste (Pst) is to be eliminated, the paper member (42) is reeled, causing the mask-contact region (R) to be replaced.

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Inventors:
TANAKA TETSUYA
TOKITA KUNIHIKO
Application Number:
PCT/JP2010/007238
Publication Date:
June 23, 2011
Filing Date:
December 13, 2010
Export Citation:
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Assignee:
PANASONIC CORP (JP)
TANAKA TETSUYA
TOKITA KUNIHIKO
International Classes:
B41F15/12; B41F15/08; B41F35/00; H05K3/34
Foreign References:
JP2000168040A2000-06-20
JPS61164895A1986-07-25
JPH0271667U1990-05-31
JPH10296960A1998-11-10
JPH11157053A1999-06-15
JP2003260781A2003-09-16
Attorney, Agent or Firm:
OGURI, Shohei et al. (JP)
Shohei Oguri (JP)
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