Title:
SEAMLESS OFFSET CYLINDRICAL PRINTING PLATE AND MANUFACTURING METHOD THEREFOR AND REPRODUCTION PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/104327
Kind Code:
A1
Abstract:
Provided are a seamless offset cylindrical printing plate and a manufacturing method therefor and a reproduction processing method by which seamless continuous printing can be performed.
The seamless offset cylindrical printing plate comprises: a cylindrical plate base material; a hydrophilic satin-finished rough surface formed on the surface of the cylindrical plate base material; and a hydrophobic resist pattern part formed on the satin-finished rough surface, wherein a part where the satin-finished rough surface is exposed constitutes a non-image part, and the resist pattern part constitutes an image part.
Inventors:
SHIGETA TATSUO (JP)
Application Number:
PCT/JP2016/083639
Publication Date:
June 22, 2017
Filing Date:
November 14, 2016
Export Citation:
Assignee:
THINK LABS KK (JP)
International Classes:
B41C1/10; B41N1/22; B41C1/18; B41N1/14; B41N3/04; G03F7/00
Foreign References:
| JPH09123388A | 1997-05-13 | |||
| JPH10128944A | 1998-05-19 | |||
| JPH10128945A | 1998-05-19 | |||
| JP2002160344A | 2002-06-04 | |||
| JP2002240232A | 2002-08-28 | |||
| JP2005047246A | 2005-02-24 | |||
| JP2003080816A | 2003-03-19 | |||
| JP2002370466A | 2002-12-24 |
Other References:
See also references of EP 3392052A4
Attorney, Agent or Firm:
ISHIHARA, Shinsuke et al. (JP)
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