Title:
SELF-ORGANIZED-FILM FORMING METHOD, PATTERN FORMING METHOD, AND SELF-ORGANIZED-FILM FORMING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2016/133115
Kind Code:
A1
Abstract:
The present invention relates to a self-organized-film forming method comprising a step for forming a coating film on a substrate by using a self-organized-film forming composition that contains a solvent and at least one type of a first polymer that can form a phase-separated structure through self-organization, wherein the solvent contains an aromatic-ring-containing compound. It is preferred that self-organized-film forming method further comprise a step for heating the coating film. It is preferred that the solvent contain the aromatic-ring-containing compound at 80 mass% or less and 50 mass% or more. It is preferred that the self-organized-film forming composition further contain a second polymer having smaller surface free energy than the first polymer and that the second polymer be unevenly distributed above the self-organized film.
Inventors:
KOMATSU HIROYUKI (JP)
ODA TOMOHIRO (JP)
NARUOKA TAKEHIKO (JP)
NAGAI TOMOKI (JP)
ODA TOMOHIRO (JP)
NARUOKA TAKEHIKO (JP)
NAGAI TOMOKI (JP)
Application Number:
PCT/JP2016/054567
Publication Date:
August 25, 2016
Filing Date:
February 17, 2016
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
B05D7/24; C09D201/00; H01L21/3065
Foreign References:
| JP2013212569A | 2013-10-17 | |||
| JP2013166932A | 2013-08-29 | |||
| JP2014011245A | 2014-01-20 | |||
| JP2013209515A | 2013-10-10 | |||
| JP2005146023A | 2005-06-09 | |||
| JP2005054118A | 2005-03-03 | |||
| JP2008036491A | 2008-02-21 | |||
| JP2015170723A | 2015-09-28 |
Attorney, Agent or Firm:
AMANO KAZUNORI (JP)
Kazuki Amano (JP)
Kazuki Amano (JP)
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