Title:
SEMICONDUCTOR APPARATUS
Document Type and Number:
WIPO Patent Application WO/2023/189055
Kind Code:
A1
Abstract:
This semiconductor apparatus comprises: a chip that has a first main surface as a device surface and a second main surface as a non-device surface; and a drift slope region of a first conductivity type that is formed in the chip and has a concentration profile such that the impurity concentration in the end on the first main surface side is lower than the impurity concentration in the end on the second main surface side.
Inventors:
NAKANO YUKI (JP)
Application Number:
PCT/JP2023/006634
Publication Date:
October 05, 2023
Filing Date:
February 24, 2023
Export Citation:
Assignee:
ROHM CO LTD (JP)
International Classes:
H01L29/78; H01L29/06; H01L29/12; H01L29/739; H01L29/872
Domestic Patent References:
| WO2017169176A1 | 2017-10-05 |
Foreign References:
| US20180019335A1 | 2018-01-18 | |||
| JP2016502761A | 2016-01-28 | |||
| JP2015156479A | 2015-08-27 | |||
| JP2000512075A | 2000-09-12 | |||
| JPH1140808A | 1999-02-12 | |||
| JP2013222907A | 2013-10-28 | |||
| JP2018142577A | 2018-09-13 | |||
| JP2014175313A | 2014-09-22 |
Attorney, Agent or Firm:
AI ASSOCIATION OF PATENT AND TRADEMARK ATTORNEYS (JP)
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