Title:
SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SUBSTRATE PROCESSING DEVICE, AND RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2016/042663
Kind Code:
A1
Abstract:
A semiconductor device manufacturing method includes (a) a step for vertically arranging and storing a plurality of substrates in a processing container, and for forming a condition in which at least an upper region or a lower region relative to a substrate disposing region where the plurality of substrates are arranged is blocked off by an adaptor, and (b) a step for, while maintaining the condition, forming films on the plurality of substrates, respectively, by performing a cycle including the following steps a predetermined number of times in a non-simultaneous manner: (b1) a step for supplying a source gas to the plurality of substrates in the processing container from the side of the substrate disposing region; (b2) a step for discharging the source gas from the interior of the processing container via exhaust piping; (b3) a step for supplying a reaction gas to the plurality of substrates in the processing container from the side of the substrate disposing region; and (b4) a step for discharging the reaction gas from the interior of the processing container via the exhaust piping.
Inventors:
NODA TAKAAKI (JP)
NOHARA SHINGO (JP)
KONNO KOTARO (JP)
SAWADA MOTOSHI (JP)
TAKAGI KOSUKE (JP)
HANASHIMA TAKEO (JP)
SUEYOSHI MAMORU (JP)
NOHARA SHINGO (JP)
KONNO KOTARO (JP)
SAWADA MOTOSHI (JP)
TAKAGI KOSUKE (JP)
HANASHIMA TAKEO (JP)
SUEYOSHI MAMORU (JP)
Application Number:
PCT/JP2014/074869
Publication Date:
March 24, 2016
Filing Date:
September 19, 2014
Export Citation:
Assignee:
HITACHI INT ELECTRIC INC (JP)
International Classes:
C23C16/455; H01L21/31; H01L21/316
Domestic Patent References:
| WO2014080785A1 | 2014-05-30 |
Foreign References:
| JP2011129879A | 2011-06-30 | |||
| JP2009182286A | 2009-08-13 | |||
| JP2014056961A | 2014-03-27 | |||
| JPH09251960A | 1997-09-22 | |||
| JP2014013928A | 2014-01-23 | |||
| JP2011018707A | 2011-01-27 | |||
| JP2011199134A | 2011-10-06 | |||
| JP2001291670A | 2001-10-19 | |||
| JP2004221227A | 2004-08-05 |
Attorney, Agent or Firm:
POLAIRE I. P. C. (JP)
Polaire Intellectual Property Corporation (JP)
Polaire Intellectual Property Corporation (JP)
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