Title:
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2024/047995
Kind Code:
A1
Abstract:
This semiconductor device comprises: an amorphous substrate having an insulating surface; an orientation pattern located on the amorphous substrate; and a semiconductor pattern including gallium nitride and located on the upper surface of the orientation pattern, wherein the orientation pattern includes: a first pattern part in which the angle of the side face relative to the bottom face is a first angle; and a second pattern part in which the angle of the side face relative to the bottom face is a second angle smaller than the first angle, the second pattern part being positioned below the first pattern part.
Inventors:
AOKI HAYATA (JP)
NISHIMURA MASUMI (JP)
NISHIMURA MASUMI (JP)
Application Number:
PCT/JP2023/021217
Publication Date:
March 07, 2024
Filing Date:
June 07, 2023
Export Citation:
Assignee:
JAPAN DISPLAY INC (JP)
International Classes:
H01L21/20; C23C14/06; H01L21/3065; H01L21/338; H01L29/778; H01L29/812; H01L33/32
Foreign References:
| JP2009164611A | 2009-07-23 | |||
| JP2012119481A | 2012-06-21 | |||
| JP2007311833A | 2007-11-29 | |||
| JP2009167087A | 2009-07-30 | |||
| JP2013227198A | 2013-11-07 | |||
| JP2000124140A | 2000-04-28 | |||
| JP2011135060A | 2011-07-07 | |||
| JP2011114267A | 2011-06-09 | |||
| US20110012109A1 | 2011-01-20 |
Attorney, Agent or Firm:
TAKAHASHI, HAYASHI AND PARTNER PATENT ATTORNEYS, INC. (JP)
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