Title:
SEMICONDUCTOR MANUFACTURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2023/277450
Kind Code:
A1
Abstract:
A semiconductor manufacturing device according to the present embodiment comprises: an ultraviolet ray forming unit which is located in an ultraviolet ray forming chamber and forms ultraviolet rays of desired wavelengths by irradiating an intensive electron beam (e-beam) to form a linear plasma; a substrate driving unit which is located in a processing chamber in which a charged substrate is processed with the ultraviolet rays and comprises a chuck that supports the charged substrate, and an axis for rotating the chuck; and a window which is located between the ultraviolet ray forming unit and the processing chamber and allows the formed ultraviolet rays to pass through the processing chamber.
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| JPS5669374 | DRY ETCHING METHOD |
Inventors:
NA SEOUNG-JU (KR)
PARK HEUNG-GYOON (KR)
PARK HEUNG-GYOON (KR)
Application Number:
PCT/KR2022/008953
Publication Date:
January 05, 2023
Filing Date:
June 23, 2022
Export Citation:
Assignee:
NEXTIN INC (KR)
International Classes:
H01J37/32; H01J37/06
Foreign References:
| JPH04181647A | 1992-06-29 | |||
| JP2001052645A | 2001-02-23 | |||
| JPH0480372A | 1992-03-13 | |||
| KR20210075254A | 2021-06-23 | |||
| US20160379802A1 | 2016-12-29 | |||
| KR102374482B1 | 2022-03-16 |
Attorney, Agent or Firm:
ISIS IP LAW LLC (KR)
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