Title:
SEMICONDUCTOR PROCESS APPARATUS AND EXHAUST ADJUSTING MECHANISM
Document Type and Number:
WIPO Patent Application WO/2024/083066
Kind Code:
A1
Abstract:
Provided in the embodiments of the invention are a semiconductor process apparatus and an exhaust adjusting mechanism. A process chamber of the semiconductor process apparatus comprises a plurality of accommodating cavities stacked in the vertical direction, and the accommodating cavities are used for accommodating wafers to be processed; an exhaust device comprises exhaust assemblies, and the plurality of exhaust assemblies correspond to the plurality of accommodating cavities on a one-to-one basis and are in communication therewith; each exhaust assembly comprises an exhaust pipe and an exhaust adjusting mechanism; the exhaust pipe extends in a first direction, the exhaust pipe is in communication with the accommodating cavity on one side of a peripheral wall thereof, and one end of the exhaust pipe is connected to an air extractor; and the exhaust adjusting mechanism extends in the first direction, and an adjusting end of the exhaust adjusting mechanism is accommodated in the exhaust pipe, and is configured to be movable in the first direction so as to adjust the flow of gas exhausted from the accommodating cavity.
Inventors:
XU LU (CN)
LI HUAN (CN)
ZHAO HONGYU (CN)
ZHANG JINGBO (CN)
LI HUAN (CN)
ZHAO HONGYU (CN)
ZHANG JINGBO (CN)
Application Number:
PCT/CN2023/124683
Publication Date:
April 25, 2024
Filing Date:
October 16, 2023
Export Citation:
Assignee:
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO LTD (CN)
International Classes:
H01L21/67; B08B3/04
Attorney, Agent or Firm:
TEE & HOWE INTELLECTUAL PROPERTY ATTORNEYS (CN)
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