Title:
SEMICONDUCTOR TESTING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2013/118619
Kind Code:
A1
Abstract:
Provided is a semiconductor wafer probing testing apparatus with excellent repeatability and ease of maintenance. A gas inlet for supplying an oxidation preventing gas for preventing the oxidation of a probe needle (11) is disposed on the interior wall of a shielding structure (13) mounted on a wafer probing stage inside a prober so as to surround the outer surface of a wafer (14). By supplying oxidation preventing gas (23) from the gas inlet so that the gas flows over the circumference of the wafer and the surface of the wafer towards the part of the wafer where the probe needle (11) makes contact with the wafer, a gas atmosphere in the vicinity of the probe needle is maintained by the oxidation preventing gas. By doing so, it becomes unnecessary to mount a spray nozzle on top of a probe guard (12), and therefore it becomes unnecessary to adjust the position of the nozzle that accompanies the replacing of the probe guard. Also, regardless of the configuration of the probe guard, it is possible to spray anti-oxidation gas even with respect to a vertical probe guard.
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Inventors:
YOSHIOKA KOHJI
Application Number:
PCT/JP2013/051990
Publication Date:
August 15, 2013
Filing Date:
January 30, 2013
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
H01L21/66
Foreign References:
| JP2004111442A | 2004-04-08 | |||
| JPS6246265Y2 | 1987-12-12 |
Attorney, Agent or Firm:
MASAKI, YOSHIFUMI (JP)
Yoshifumi Masaki (JP)
Yoshifumi Masaki (JP)
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Claims: