Title:
SENSITIVITY-ADJUSTABLE OPTICAL MEASUREMENT APPARATUS AND METHOD FOR PLASMA MAGNETIC FIELD
Document Type and Number:
WIPO Patent Application WO/2023/184719
Kind Code:
A1
Abstract:
A sensitivity-adjustable optical measurement apparatus and method for a plasma magnetic field, the method comprising: constructing an optical-activity measurement system on the basis of a pulse laser beam, wherein the optical-activity measurement system is used for performing measurement on an optical activity image and a shadow image (S101); processing the optical activity image and the shadow image, and obtaining the distribution of proportional coefficients on the basis of the distribution of light intensities (S102); obtaining the distribution of deflection angles on the basis of a mapping relationship between the proportional coefficients and the deflection angles (S103); constructing an interference measurement system on the basis of the pulse laser beam, and measuring a fringe offset of an interference image (S104); performing calculation on the basis of the fringe offset of the interference image to obtain the distribution of electron area densities (S105); and obtaining a two-dimensional distribution of an average magnetic field on the basis of the deflection angles and the electron area densities (S106). In the method, the distribution of deflection angles is determined by means of measuring intensity changes in an optical activity image and a shadow image, the distribution of electron area densities is measured by means of an interference image, the magnetic field intensity of a plasma is determined, and the sensitivity of optical-activity measurement is adjusted by means of adjusting the splitting ratios of beam splitters, thereby realizing sensitivity-adjustable measurement for magnetic induction intensity.
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Inventors:
WU JIAN (CN)
JIANG ZHIYUAN (CN)
CHEN ZIWEI (CN)
WANG ZHENYU (CN)
WANG WEI (CN)
ZHOU XINMIAO (CN)
SHI HUANTONG (CN)
LI XINGWEN (CN)
JIANG ZHIYUAN (CN)
CHEN ZIWEI (CN)
WANG ZHENYU (CN)
WANG WEI (CN)
ZHOU XINMIAO (CN)
SHI HUANTONG (CN)
LI XINGWEN (CN)
Application Number:
PCT/CN2022/099531
Publication Date:
October 05, 2023
Filing Date:
June 17, 2022
Export Citation:
Assignee:
UNIV XI AN JIAOTONG (CN)
International Classes:
G01R33/032
Foreign References:
| CN114252816A | 2022-03-29 | |||
| CN112894149A | 2021-06-04 | |||
| CN111366881A | 2020-07-03 | |||
| JPH07333256A | 1995-12-22 | |||
| JP2000131351A | 2000-05-12 |
Attorney, Agent or Firm:
XI'AN TONG DA PATENT AGENCY CO., LTD. (CN)
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