Title:
SHOT PROCESSING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2017/208621
Kind Code:
A1
Abstract:
Provided is a shot processing apparatus whereby scattering of a projection material to the outside can be suppressed without reducing projection efficiency. This shot processing apparatus has: a cabinet; a drum housed in the cabinet and provided with an opening through which a work piece can be charged, the drum being selectively disposed in a work piece charging position in which a work piece is charged, a work piece processing position in which the work piece is ground by a projection material, and a work piece discharge position in which the work piece is discharged; a projecting machine for projecting the projection material into the drum; and a lid part for opening and closing the drum opening, a projection port for the projection material being formed in the lid part, and the lid part being configured so that the projecting machine is attached thereto and the projection material is projected from the projection port; the projection port being disposed above the drum opening when the drum opening is opened by the lid part.
Inventors:
UMEOKA MASATO (JP)
YAMAMOTO SHOICHI (JP)
YAMAMOTO SHOICHI (JP)
Application Number:
PCT/JP2017/014540
Publication Date:
December 07, 2017
Filing Date:
April 07, 2017
Export Citation:
Assignee:
SINTOKOGIO LTD (JP)
International Classes:
B24C7/00; B24C3/30; B24C9/00
Domestic Patent References:
| WO2005007344A1 | 2005-01-27 | |||
| WO2011114550A1 | 2011-09-22 |
Foreign References:
| JPS5689456U | 1981-07-17 | |||
| US4648214A | 1987-03-10 | |||
| JP2011110642A | 2011-06-09 | |||
| JPH08300263A | 1996-11-19 | |||
| JPH0569325A | 1993-03-23 | |||
| JPH0529669U | 1993-04-20 |
Other References:
See also references of EP 3424641A4
Attorney, Agent or Firm:
TANAKA Shinichiro et al. (JP)
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