Title:
SILICEOUS FILM WITH SMALLER FLAT BAND SHIFT AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2006/016672
Kind Code:
A1
Abstract:
Disclosed are a method for producing a siliceous film having excellent insulating characteristics, and a coating composition used therefor. Specifically disclosed is a coating composition containing a perhydropolysilazane or modified perhydropolysilazane having a number average molecular weight of 100-50,000 and an aluminum compound having a molar ratio of aluminum atoms to silicon atoms of not less than 10 ppb and not more than 100 ppm. A siliceous film is produced by coating such a coating composition on a substrate and firing the coated substrate in an atmosphere containing water vapor, oxygen or a gas mixture of them.
Inventors:
SHIMIZU YASUO (JP)
ICHIYAMA MASAAKI (JP)
NAGURA TERUNO (JP)
ICHIYAMA MASAAKI (JP)
NAGURA TERUNO (JP)
Application Number:
PCT/JP2005/014819
Publication Date:
February 16, 2006
Filing Date:
August 12, 2005
Export Citation:
Assignee:
AZ ELECTRONIC MATERIALS JAPAN (JP)
AZ ELECTRONIC MATERIALS USA (US)
SHIMIZU YASUO (JP)
ICHIYAMA MASAAKI (JP)
NAGURA TERUNO (JP)
AZ ELECTRONIC MATERIALS USA (US)
SHIMIZU YASUO (JP)
ICHIYAMA MASAAKI (JP)
NAGURA TERUNO (JP)
International Classes:
C09D183/16; B32B9/00; B32B18/00; C01B33/12; H01B3/46; H01L21/316; H01L21/762; H01L29/78
Foreign References:
| JPH11105185A | 1999-04-20 | |||
| JPH11105187A | 1999-04-20 | |||
| JP2001026415A | 2001-01-30 | |||
| JP2002075982A | 2002-03-15 | |||
| JPH07196986A | 1995-08-01 | |||
| JPS63191832A | 1988-08-09 | |||
| JPH01221466A | 1989-09-04 | |||
| JPH06299118A | 1994-10-25 | |||
| JPH06306329A | 1994-11-01 |
Other References:
See also references of EP 1785459A4
Attorney, Agent or Firm:
Yoshitake, Kenji (Room 323, Fuji Bldg.,, 2-3, Marunouchi 3-chome, Chiyoda-ku Tokyo, JP)
Download PDF: