SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS CYCLIC ORGANIC GROUP HAVING HETEROATOM

WIPO Patent Application WO/2014/046055

A1

[Problem] To provide a resist underlayer film-forming composition for lithography. [Solution] A resist underlayer film-forming composition for lithography, which contains, as a silane, at least one substance selected from among hydrolyzable organosilanes, hydrolysis products thereof and hydrolysis-condensation products thereof, said silane containing a silane which has a cyclic organic group that contains, as ring-constituting atoms, a carbon atom, a nitrogen atom and a heteroatom other than the carbon atom and the nitrogen atom. The hydrolyzable organosilanes are represented by formula (1). (In formula (1), at least one group among R1, R2 and R3 represents a group to which an -Si(X)3 group is bonded through an alkylene group having 1-10 carbon atoms, and each of the remainder represents a hydrogen atom, an alkyl group having 1-10 carbon atoms or an aryl group having 6-40 carbon atoms; ring A represents a five- to ten-membered cyclic organic group which contains, as ring-constituting atoms, a carbon atom and at least one nitrogen atom, while additionally containing a sulfur atom or an oxygen atom; and X represents an alkoxy group, an acyloxy group or a halogen atom.)

KANNO YUTA (JP)
NAKAJIMA MAKOTO (JP)
TAKASE KENJI (JP)
TAKEDA SATOSHI (JP)
WAKAYAMA HIROYUKI (JP)

PCT/JP2013/074881

March 27, 2014

September 13, 2013

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NISSAN CHEMICAL IND LTD (JP)

G03F7/11; C08G77/26; C08G77/28; H01L21/027

WO2010021290A1

2010-02-25

JP2007231198A	2007-09-13
JPH0356177A	1991-03-11
CN102584884A	2012-07-18
JPS4953629A	1974-05-24

HANABUSA, Tsuneo et al. (JP)
Sepal Tsuneo (JP)

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