Title:
SILOXANE-BASED COMPOSITION AND CURED PRODUCT THEREOF, AND USE THEREFOR
Document Type and Number:
WIPO Patent Application WO/2013/061823
Kind Code:
A1
Abstract:
[Problem] To obtain a material for a heat-resistant sealing material possessing greater heat resistance, free of degradation even when exposed to temperatures 130°C or higher for a long period of time. [Solution] A composition comprising a metal compound and a siloxane compound (A) represented by general formula (1) (in the formula, X is represented by general formula X1 or X2, X1 being 1-8 and X2 being 0-7; R1 to R4 are a hydrogen atom, a C1-8 alkyl group, alkenyl group, or alkynyl group, or a C6-8 aryl group, a hydrogen atom optionally being substituted by a fluorine atom; R5 is a C1-18 alkyl group, alkenyl group, alkynyl group, or aryl group, a hydrogen atom being optionally substituted by a fluorine atom, a carbon atom being optionally substituted by an oxygen atom or a nitrogen atom; R6 is a hydrogen atom or a vinyl group; m and n are 1-4; and 3 ≤ m+n).
Inventors:
YAMANAKA KAZUHIRO (JP)
EGUCHI HIROSHI (JP)
NAKATSUJI JUNYA (JP)
SUDA TAKESHI (JP)
AKIYAMA KATSUHIRO (JP)
EGUCHI HIROSHI (JP)
NAKATSUJI JUNYA (JP)
SUDA TAKESHI (JP)
AKIYAMA KATSUHIRO (JP)
Application Number:
PCT/JP2012/076683
Publication Date:
May 02, 2013
Filing Date:
October 16, 2012
Export Citation:
Assignee:
CENTRAL GLASS CO LTD (JP)
International Classes:
C08L83/07; C07F7/21; C08G77/12; C08G77/20; C08G77/38; C08G77/50; C08L83/05
Domestic Patent References:
| WO2008010545A1 | 2008-01-24 | |||
| WO2008133138A1 | 2008-11-06 | |||
| WO2012144480A1 | 2012-10-26 |
Foreign References:
| JP2007031619A | 2007-02-08 | |||
| JP2009173759A | 2009-08-06 | |||
| JP2010254927A | 2010-11-11 | |||
| JP2011068752A | 2011-04-07 |
Other References:
GERARD M. SCHMID ET AL.: "Implementation of an imprint damascene process for interconnect fabrication", J. VAC. SCI. TECHNOL. B, vol. 24, no. 3, 2006, pages 1283 - 1291, XP012091479, DOI: doi:10.1116/1.2197508
ALAN R. BASSINDALE ET AL.: "Derivatisation of octasilsesquioxane with alcohols and silanols", JOURNAL OF ORGANOMETALLIC CHEMISTRY, vol. 521, 1996, pages 391 - 393, XP004036386, DOI: doi:10.1016/0022-328X(96)06322-X
ALAN R. BASSINDALE ET AL.: "Derivatisation of octasilsesquioxane with alcohols and silanols", JOURNAL OF ORGANOMETALLIC CHEMISTRY, vol. 521, 1996, pages 391 - 393, XP004036386, DOI: doi:10.1016/0022-328X(96)06322-X
Attorney, Agent or Firm:
KOBAYASHI, Hiromichi et al. (JP)
Hiromichi Kobayashi (JP)
Hiromichi Kobayashi (JP)
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Claims:
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