Title:
SILSESQUIOXANE COMPOUND AND METHOD FOR PRODUCING SAME, HARD COAT COMPOSITION, HARD COAT FILM, AND METHODS FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2021/172200
Kind Code:
A1
Abstract:
A silsesquioxane compound according to one embodiment of the present invention is a condensation product of a silane compound and has a structure represented by [R1-Si]. R1 is an organic group including an alicyclic epoxy group. The ratio of the structure to the total number of Si atoms is preferably 0.2-1.0. The number weight average molecular weight of the silsesquioxane compound is preferably 500-20000, and a ratio T3/T2 of a T3 structure to a T2 structure is preferably 0.8-5 (exclusive of 5). The silsesquioxane compound is very suitably used in the formation of a hard coat layer. This hard coat composition may include a photocationic polymerization initiator in addition to the silsesquioxane compound.
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Inventors:
ISHIGURO FUMIYASU (JP)
TAGUCHI YUSUKE (JP)
MORI RIKA (JP)
KOMA HIROTO (JP)
KOMATSU SATOKO (JP)
TAGUCHI YUSUKE (JP)
MORI RIKA (JP)
KOMA HIROTO (JP)
KOMATSU SATOKO (JP)
Application Number:
PCT/JP2021/006353
Publication Date:
September 02, 2021
Filing Date:
February 19, 2021
Export Citation:
Assignee:
KANEKA CORP (JP)
International Classes:
C08G59/02; B32B27/00; C08G59/68; C08G77/08; C09D163/00; C09D183/06
Domestic Patent References:
| WO2016098596A1 | 2016-06-23 | |||
| WO2016052413A1 | 2016-04-07 |
Foreign References:
| JP2017113943A | 2017-06-29 | |||
| JP2016193956A | 2016-11-17 | |||
| JP2016160342A | 2016-09-05 |
Attorney, Agent or Firm:
HARUKA PATENT & TRADEMARK ATTORNEYS (JP)
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