SILVER NANOWIRE PHOTORESIST, TOUCH STRUCTURE, AND DISPLAY DEVICE

WIPO Patent Application WO/2023/245624

A1

Disclosed in the present invention is a silver nanowire photoresist, comprising a silver nanowire and a dispersion resin. The dispersion resin is represented by formula (1): (Z-A)n-Rm(1); in the formula (1), n=1-5, m=1-5, and n+m≤6; Z represents H, or an acrylic acid copolymer that contains an amino group, an epoxy group, an alkyl group having 1 to 14 carbon atoms, a cycloalkyl group having 3 to 14 carbon atoms, or an aryl substituent; R represents C, N, or CH group, or at least one of a straight-chain alkyl group having 2 to 14 carbon atoms, an aliphatic cycloalkyl group having 2 to 14 carbon atoms, an aryl group having 3 to 14 carbon atoms, and a heteroaryl group; and A is represented by formula (2), and in the formula (2), W is linked to Z, and a carboxyl group is linked to R.

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ZHONG MEIDI (CN)
CHEN YULONG (CN)
LI WEI (CN)
YUN XIANGJUN (CN)
TANG JUNSONG (CN)
DAI JIAQIAN (CN)

PCT/CN2022/101145

December 28, 2023

June 24, 2022

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SHENZHEN BRTHRBORDER SEMICONDUCTOR MAT CO LTD (CN)

G03F7/004; G03F7/027; G06F3/041; G06F3/044

WO2021111886A1

2021-06-10

CN108181785A	2018-06-19
CN103488049A	2014-01-01
CN101928570A	2010-12-29
US20200319751A1	2020-10-08

SUZHOU LINGSEM INTELLECTUAL PROPERTY AGENCY CO., LTD (CN)

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